光学材料抛光亚表面损伤检测及材料去除机理

抛光后光学元件仍然存在亚表面损伤,它降低光学元件的抗激光损伤能力和光学性能,为去除抛光亚表面损伤以提升光学元件使用性能,需要对其进行准确检测和表征.首先,采用恒定化学蚀刻速率法和二次离子质谱法分别检测水解层深度和抛光杂质的嵌入深度.然后,使用原子力显微镜检测亚表面塑性划痕的几何尺寸.通过分析表面粗糙度沿深度的演变规律,研究浅表面流动层、水解层和亚表面塑性划痕间的依存关系.最后,建立抛光亚表面损伤模型,并在此基础上探讨抛光材料去除机理.研究表明:水解层内包括浅表面流动层、塑性划痕和抛光过程嵌入的抛光杂质;石英玻璃水解层深度介于76和105nm之间;抛光过程是水解反应、机械去除和塑性流动共同作用的结果.

Detection of Subsurface Damage and Material Removal Mechanism in Optical Polishing Process

Subsurface damage(SSD) may still exist in polished elements,which influences laser induced damage threshold and optical performance.Therefore,SSD must be reduced and finally removed from the polished surface to improve the service performance of optical elements.Hence it is required to make the accurate detection and characterization of the polishing SSD.In the current approach,firstly,the depth of hydrolyzed layer and embedded polishing contaminants were detected with constancy chemical etch rate technique...