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微波铁氧体基片精密研抛技术研究
引用本文:王贵林,张飞虎.微波铁氧体基片精密研抛技术研究[J].国防科技大学学报,2007,29(3):113-117.
作者姓名:王贵林  张飞虎
作者单位:1. 国防科技大学机电工程与自动华学院,湖南 长沙 410073
2. 哈尔滨工业大学机械制造及自动化系,黑龙江 哈尔滨 150001
基金项目:中国博士后科学基金资助项目(2004035530)
摘    要:针对微波铁氧体基片的功能要求和材料特性,基于坐标变换法对平行式研磨、抛光加工区域的相对运动轨迹进行仿真研究,为合理选择工艺参数提供理论依据;通过正交化实验分析各种工艺参数对研磨效率的影响规律;在此基础上,采用优化组合的工艺参数进行微波铁氧体基片平行式研磨和抛光加工,技术指标均达到或超过了使用要求。

关 键 词:微波铁氧体  基片  正交化实验  研磨  抛光
文章编号:1001-2486(2007)03-0113-05
收稿时间:2006/12/15 0:00:00
修稿时间:2006年12月15

Study on Precision Lapping and Polishing Technology of Microwave Ferrite Substrates
WANG Guilin and ZHANG Feihu.Study on Precision Lapping and Polishing Technology of Microwave Ferrite Substrates[J].Journal of National University of Defense Technology,2007,29(3):113-117.
Authors:WANG Guilin and ZHANG Feihu
Abstract:According to the functional requirement and material characteristic of microwave ferrite substrates,the simulation process of relative motion trace was studied in the parallel lapping and polishing area by using coordinate transformation method,and it provided the theoretic foundation for the reasonable selection of processing parameters.The influence rules of various parameters on lapping efficiency were studied with the orthogonalizing experimental method.On the basis of the above,the parallel lapping and polishing experiments of microwave ferrite substrates were completed by using the optimum combination of processing parameters,and the quality of these substrates satisfied or preponderated the requirements.
Keywords:microwave ferrite  substrate  orthogonalizing experiments  lapping  polishing
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